Effect of rapid thermal annealing on InP1-xBix grown by molecular beam epitaxy
Journal article, 2015
ilute bismides
hotoluminescence
InPBi
hermal annealing
hermal tability
eep level
Author
X. Y. Wu
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
K. Wang
Chinese Academy of Sciences
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
W. W. Pan
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
P. Wang
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Y. Li
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Yuxin Song
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Yi Gu
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
L. Yue
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
H. Xu
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Z. Zhang
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
J. Cui
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Q. Gong
Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences
Shu Min Wang
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Semiconductor Science and Technology
0268-1242 (ISSN) 1361-6641 (eISSN)
Vol. 30 9Subject Categories (SSIF 2011)
Atom and Molecular Physics and Optics
DOI
10.1088/0268-1242/30/9/094014