Gate stacks
Book chapter, 2010
Gate stacks
AlN buffer layer
MOSFETs
GdSiO/LaSiO
Metal gate
Author
Olof Engström
Chalmers, Applied Physics, Physical Electronics
I. Z. Mitrovic
University of Liverpool
S. Hall
University of Liverpool
Bahman Raeissi
Tyndall National Institute at National University of Ireland, Cork
K. Cherkaoui
Tyndall National Institute at National University of Ireland, Cork
S Monaghan
Tyndall National Institute at National University of Ireland, Cork
H. D. B. Gottlob
Gesellschaft fur Angewandte Mikro- und Optoelektronik mbH
M.C. Lemme
Harvard University
Nanoscale CMOS: Innovative Materials, Modeling and Characterization
23 - 67
978-184821180-3 (ISBN)
Areas of Advance
Information and Communication Technology
Nanoscience and Nanotechnology
Subject Categories (SSIF 2011)
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1002/9781118621523.ch2
ISBN
978-184821180-3