1200 V 4H-SiC BJTs with a Common Emitter Current Gain of 60 and Low On-resistance
Paper i proceeding, 2009

This paper reports a 4H-SiC bipolar junction transistor (BJT) with a breakdown voltage (BV(CEO)) of 1200 V, a maximum current gain (beta) of 60 and the low on-resistance (R(sp-on))of 5.2 m Omega cm(2). The high gain is attributed to an improved surface passivation SiO(2) layer which was grown in N(2)O ambient in a diffusion furnace. The SiC BJTs with passivation oxide grown in N(2)O ambient show less emitter size dependence than reference SiC BJTs, with conventional SiO(2) passivation, due to a reduced surface recombination current. SiC BJT devices with an active area of 1.8 mm x 1.8 mm showed a current gain of 53 in pulsed mode and a forward voltage drop Of V(CE)=2V at I(C)=15 A (J(C)=460 A/cm(2)).

Emitter size effect

Junction Termination

Surface recombination

Bipolar Junction Transistor

Författare

Hyung-Seok Lee

The Royal Institute of Technology (KTH)

Martin Domeij

The Royal Institute of Technology (KTH)

Carl-Mikael Zetterling

The Royal Institute of Technology (KTH)

Reza Ghandi

The Royal Institute of Technology (KTH)

Mikael Östling

The Royal Institute of Technology (KTH)

Fredrik Allerstam

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Einar Sveinbjörnsson

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Materials Science Forum

0255-5476 (ISSN)

Vol. 600-603 1151-1154
9780878493579 (ISBN)

Ämneskategorier (SSIF 2011)

Materialteknik

Den kondenserade materiens fysik

DOI

10.4028/www.scientific.net/msf.600-603.1151

ISBN

9780878493579

Mer information

Skapat

2017-10-07