High quality reduced graphene oxide flakes by fast kinetically controlled and clean indirect UV-induced radical reduction
Artikel i vetenskaplig tidskrift, 2016

This work highlights a surprisingly simple and kinetically controlled highly efficient indirect method for the production of high quality reduced graphene oxide (rGO) flakes via UV irradiation of aqueous dispersions of graphene oxide (GO), in which the GO is not excited directly. While the direct photoexcitation of aqueous GO (when GO is the only light-absorbing component) takes several hours of reaction time at ambient temperature (4 h) leading only to a partial GO reduction, the addition of small amounts of isopropanol and acetone (2% and 1%) leads to a dramatically shortened reaction time by more than two orders of magnitude (2 min) and a very efficient and soft reduction of graphene oxide. This method avoids the formation of non-volatile species and in turn contamination of the produced rGO and it is based on the highly efficient generation of reducing carbon centered isopropanol radicals via the reaction of triplet acetone with isopropanol. While the direct photolysis of GO dispersions easily leads to degradation of the carbon lattice of GO and thus to a relatively low electric conductivity of the films of flakes, our indirect photoreduction of GO instead largely avoids the formation of defects, keeping the carbon lattice intact. Mechanisms of the direct and indirect photoreduction of GO have been elucidated and compared. Raman spectroscopy, XPS and conductivity measurements prove the efficiency of the indirect photoreduction in comparison with the state-of-the-art reduction method for GO (hydriodic acid/trifluoroacetic acid). The rapid reduction times and water solvent containing only small amounts of isopropanol and acetone may allow easy process up-scaling for technical applications and low-energy consumption.

p1462

defects

rter g

carbon framework

functionalization

solid-state nmr

journal of the chemical society-faraday transactions i

p5698

acetone

rate constants

chemical-reduction

Physics

v110

graphite oxide

1973

Science & Technology - Other Topics

v69

chemistry

journal of the american chemical society

1988

Materials Science

Chemistry

huchmann mn

aqueous-solution

Författare

R. Flyunt

Institut fur Oberflachenmodifizierung Leipzig eV

W. Knolle

Institut fur Oberflachenmodifizierung Leipzig eV

Axel Kahnt

Friedrich-Alexander-Universität Erlangen-Nürnberg

C. E. Halbig

Friedrich-Alexander-Universität Erlangen-Nürnberg

A. Lotnyk

Institut fur Oberflachenmodifizierung Leipzig eV

T. Haupl

Institut fur Oberflachenmodifizierung Leipzig eV

A. Prager

Institut fur Oberflachenmodifizierung Leipzig eV

Siegfried Eigler

Chalmers, Kemi och kemiteknik

B. Abel

Institut fur Oberflachenmodifizierung Leipzig eV

Nanoscale

2040-3364 (ISSN)

Vol. 8 14 7572-7579

Styrkeområden

Nanovetenskap och nanoteknik

Ämneskategorier (SSIF 2011)

Nanoteknik

Kemi

DOI

10.1039/c6nr00156d

Mer information

Skapat

2017-10-07