Surface characterization, electrochemical properties and in vitro testing of hierarchically structured titanium surfaces
Artikel i vetenskaplig tidskrift, 2013
Newly designed implant surfaces with hierarchic structure have been characterized with respect to chemical composition, topography, electrical properties and cell culturing. Three levels of surface roughness are induced starting from a blasted surface with the naturally formed oxide layer. Dissolution of the blasted surface is obtained by chemical treatment in oxalic acid. The surface becomes smoother with multitude of shallow depressions in the walls and bottoms of the blasted structure. The surface oxide layer formed is somewhat thicker than the naturally formed oxide and may contain oxalate. In the final step, part of the oxide layer is dissolved in hydrofluoric acid leading to a high concentration of soluble titanium species. A nanostructured surface is formed by precipitation of titanium oxide at spots on the surface where locally the pH is increased due to hydrogen evolution. The surface roughness is only marginally changed by the chemical treatment while the conductivity of the surface layer is lower for the chemically treated surfaces compared with the blasted reference. The hierarchical structure mimics many natural processes for achieving high shear strength. © 2012 Elsevier Ltd.
C. X-ray diffraction
Hydrogen
High concentration
Surface layers
Electric properties
Hydrogen evolution
Hydrofluoric acid
Surface characterization
Oxalic Acid
A. oxides
Titanium surfaces
Titanium oxides
Oxide layer
Electron microscopy
Surface oxide layer
Implant surface
Chemical compositions
Chemical treatments
Natural process
Organic acids
Nanostructured surface
X ray diffraction
Hierarchical structures
In-vitro
Surface roughness
C. electron microscopy
D. electrical properties
A. nanostructures
Hierarchic structures
Titanium
Författare
I. Mattisson
C. Gretzer
Elisabet Ahlberg
Göteborgs universitet
Materials Research Bulletin
0025-5408 (ISSN)
Vol. 48 2 389-398Ämneskategorier (SSIF 2011)
Kemi
DOI
10.1016/j.materresbull.2012.10.037