HfO2 for strained-Si and strained-SiGe MOSFETs
Paper i proceeding, 2003
We report on HfO2 gate dielectrics grown by atomic layer deposition (ALD) at 600°C on strained-Si and strained-SiGe layers. The strain status in the Si layer remained unaltered after HfO2 deposition and an interface state density of ~1×1011 cm-2 eV-1 was obtained for the case of thick HfO2 films. The breakdown fields were in the range 2-5 MV/cm, which is high compared to HfO2 films grown at higher temperatures. The leakage current was reduced by more than five orders of magnitude for the case of a thin HfO2 film with an EOT of 1.25 nm and ultra-thin cap (2.5-3 nm) layers on Si0.77Ge0.23/Si. The carrier transport through these HfO2 films was found to follow Frenkel-Poole emission over a wide range of applied gate voltage
silicon
MOSFET
leakage currents
interface states
semiconductor materials
hafnium compounds
atomic layer deposition
elemental semiconductors
Poole-Frenkel effect
dielectric thin films
Ge-Si alloys
semiconductor device breakdown
Författare
M. Y. A. Yousif
Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik
Mikael Johansson
Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik
Per Lundgren
Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik
Stefan Bengtsson
Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik
J. Sundqvist
Angstrom Laboratory
Anders Harsta
Angstrom Laboratory
H. H. Radamson
The Royal Institute of Technology (KTH)
ESSDERC 2003. Proceedings of the 33rd European Solid-State Device Research - ESSDERC '03
1930-8876 (ISSN)
255-0780379993 (ISBN)
Ämneskategorier (SSIF 2011)
Annan elektroteknik och elektronik
DOI
10.1109/ESSDERC.2003.1256862
ISBN
0780379993