Novel monocrystalline silicon micromirrors for maskless lithography
Journal article, 2008
A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.
Micromirrors
EUV lithography
Maskless Lithography
DRIE
Electrostatic actuation
Transfer bonding
Author
Martin Bring
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems Laboratory
Peter Enoksson
Chalmers, Microtechnology and Nanoscience (MC2), Electronics Material and Systems Laboratory
Sensors and Actuators, A: Physical
0924-4247 (ISSN)
Vol. 145-146 1-1 456-463Subject Categories (SSIF 2011)
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1016/j.sna.2007.10.050