NbN superconducting nanonetwork fabricated using porous silicon templates and high-resolution electron beam lithography
Journal article, 2017
Superconducting NbN nanonetworks with a very small number of interconnected nanowires, with diameter of the order of 4 nm, are fabricated combining a bottom-up (use of porous silicon nanotemplates) with a top-down technique (high-resolution electron beam lithography). The method is easy to control and allows the fabrication of devices, on a robust support, with electrical properties close to a one-dimensional superconductor that can be used fruitfully for novel applications.
quantum phase slips
one-dimensional superconductivity
porous silicon
electron beam lithography
Author
M. Salvato
Universita di Salerno
Universita degli Studi di Roma Tor Vergata
Reza Baghdadi
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
C. Cirillo
Universita di Salerno
S. L. Prischepa
Belarusian State University of Informatics and Radioelectronics
National Research Nuclear University MEPhI
A. L. Dolgiy
Belarusian State University of Informatics and Radioelectronics
V. P. Bondarenko
Belarusian State University of Informatics and Radioelectronics
Floriana Lombardi
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
C. Attanasio
Universita di Salerno
Nanotechnology
0957-4484 (ISSN) 1361-6528 (eISSN)
Vol. 28 46 465301Subject Categories (SSIF 2011)
Condensed Matter Physics
DOI
10.1088/1361-6528/aa8479